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photolithograph n.照相平版(印刷品)。vt.用照相平版印刷。adj.-...

photolithography

Therefore , the imaging characteristics of thick resist photolithograph are investigated in this paper based on the exposing and developing theories of thin film resists . firstly , the influences of nonlinearities in imaging process of thick resist lithography are studied 本論文以抗蝕劑的曝光顯影理論為基礎,深入開展了厚層抗蝕劑的成像特性的研究,可為厚膠光刻實驗提供指導依據。

With the development of memss , their structures are more and more complex , and new harmss need to be designed and fabricated . so , it is very necessary to simulate the imaging process of thick resist photolithograph 隨著mems的迅速發展,其結構愈來愈復雜,高深寬比的新型mems結構需要被設計和加工,迫切需要對厚膠光刻過程的模擬。