lithographic adj.1.平版畫的；石印的，平版印刷品的。2.平版印刷...
adj. 1.平版畫的；石印的，平版印刷品的。 2.平版印刷(術)的。 adv. -ically “lithographic artist“ 中文翻譯： 石板印刷藝術家“lithographic chalk“ 中文翻譯： 平版修版筆; 石印石“lithographic crayon“ 中文翻譯： 石印蠟毛“lithographic equipment“ 中文翻譯： 光刻裝置“lithographic film“ 中文翻譯： 平版制版膠片“lithographic imagery“ 中文翻譯： 光刻成象“lithographic ink“ 中文翻譯： 膠印油墨; 平印油墨; 石片油墨; 石印墨“lithographic limestone“ 中文翻譯： 石版質灰巖; 石印灰巖“lithographic machine“ 中文翻譯： 平版印刷機“lithographic mask“ 中文翻譯： 光刻掩模“lithographic oil“ 中文翻譯： 平印用油; 石印油“lithographic paper“ 中文翻譯： 石印紙“lithographic plate“ 中文翻譯： 平版“lithographic press“ 中文翻譯： 平板印刷機; 石版印刷機“lithographic process“ 中文翻譯： 光刻“lithographic resolution“ 中文翻譯： 光刻清晰度“lithographic slate“ 中文翻譯： 石版質板巖; 石印板巖“lithographic stone“ 中文翻譯： 石印灰巖; 石印石; 印版石“lithographic texture“ 中文翻譯： 石印結構; 石印石結構; 印板組織“lithographic varnish“ 中文翻譯： 平版用清漆; 石印清漆“direct lithographic pressman“ 中文翻譯： 直接石版印刷工“direct lithographic rotary machine“ 中文翻譯： 直接平印輪轉機“direct lithographic transferrer“ 中文翻譯： 直接石版轉印工“lithographic drawing ink“ 中文翻譯： 石印制版墨; 石印制油墨“lithographers masking paper“ 中文翻譯： 石印蒙版紙“lithographer“ 中文翻譯： n. 石印〔平版印刷〕工人。
lithography |
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The gravity analysis is carried out especially for the synthetic fused silica and calcium fluoride used in 193nm lithographic objective as well as the optical elements with structural sizes of ( 200mm ~ ( 300mm . large numbers of analysis data for surface shape error are obtained by using algor finite element analysis software . then these data are plotted into curves and comparison analysis will be carried out , finally the measures and schemes for reducing gravity deformation are proposed 因此，本論文重點對大口徑光學系統在高精度光學鏡頭裝校中，因重力變形進行了詳細的分析研究，特別針對193nm光刻物鏡系統所使用的材料sytheticfusedsilica和caleiumfluoride以及用到的結構尺寸200mm ~ 300mm光學零件進行了重力變形分析，使用algor有限元分析軟件獲得了大量的面形誤差分析數據，然后將這些數據繪成曲線進行對比分析，最后提出了減小重力變形的措施與方案，并進行了實驗，驗證了分析結果是正確的，減小重力變形的方法是有效的。 |
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Interferometirc lithographic technology incorporates laser , interference optics , diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by national natural science foundation of china . the research for this technology in theory , simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit , developing nanometer electronic and photoelectron devices , novel large screen panel display and novel lithographic equipment of our country 干涉光刻技術集激光、干涉和衍射光學及光學光刻于一體，是國家自然科學基金資助的微細加工技術和微電子領域的前沿研究課題，對其進行理論、模擬和實驗研究，對推進光學光刻極限，發展我國納米微電子和光電子器件、新型大屏幕平板顯示器和新型光刻機具有重要的科學意義和廣闊的應用前景。 |
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However , in current design flow , designers do not consider whether designs are friendly to opc before they are sent to foundries . in fact , a lot of features in such designs can not be corrected enough because of many factors such as the constraints of environments . so even though such designs are corrected , many lithographic errors still exist 然而，由于在當前的集成電路設計流中，在設計出的版圖送到制造廠商前，電路的設計者并沒有考慮版圖對光學鄰近校正和交替移相掩模的友好性問題，這使得版圖中的一些圖形由于周圍條件的限制，如無法充分進行光學鄰近校正，無法進行交替移相掩模的處理等，從而使得版圖設計即使進行了校正處理，還存在大量光刻故障的可能性。 |
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The basics of lithography process , as well as the basic structure of lithographic system and the basic theory of partially coherent imaging are introduced in this paper . a bi - linear model of optical imaging is also presented . based on these theories , the simulation process of csplat is particularly analyzed , especially the computation of tccs ( transmission cross coefficient ) under different illuminations and the processing of primary lens aberrations inside tcc computation process 本文從光刻基本過程入手，介紹了光刻機光學系統的基本組成、部分相干光透射成像的基本原理，提出了光學系統的雙線性模型，并在此基礎上詳細分析了仿真軟件splat的仿真過程，其中著重分析了光學系統的傳輸交叉系數tcc的計算，包括不同照明系統下tcc的計算以及tcc計算中像差的處理。 |
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An interferometric lithographic experimental system with maskless and multi - beam exposure is built . an experimental system with wavefront divided by a trapezoidal prism and with selectable diaphragms for kinds of multi - beam , multiple - exposure interferometric lithography research is proposed . the experimental study on interferometric lithography is carried out 建立了無掩模多光束多曝光干涉光刻實驗系統，提出了一種采用梯形棱鏡進行波前分割和利用可選擇光闌進行多種多光束多曝光干涉光刻研究的實驗系統，進行了干涉光刻實驗研究，對模擬和實驗結果進行了分析。 |
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Due to its supper - resolution imaging ability and its unique three - dimensional microfabrication ability . it has been widely used in life science , 3d - optical data storage , and lithographic microfabrication . the imaging principles of confocal microscopy have been discussed extensively by many authors , but all of those theories did n ' t account for the nonlinear effect of two - photon excitation 近十多年來，其理論研究和應用研究都取得很大進展，特別是雙光子共焦顯微鏡，由于具有極高的空間分辨率和特有的三維處理能力，因而在生物醫學研究、三維高密度存儲以及三維微細加工等領域具有變革性的應用潛力，取得了許多突破性進展，已成為光學及其交叉學科中最誘人、最活躍的研究領域之一。 |
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Among the subjects covered are intaglio printmaking , lithographic printmaking , weaving and art in hong kong . each kit contains full illustrations and descriptions , plus semi - finished and finished works demonstrated by professional artists , with some kits also featuring videos and slides 題目包括凹凸版畫、平印版畫、紡織藝術及香港藝術。每套教材內有藝術家在藝術制作過程中的半制成品、示范完成作品、圖解和說明，部分教材套 |
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Currently they are fabricated by lithographic process , which is very expensive and time consuming since it is a several step process . the laser direct writing system is the kind of tool that exposes the precision patterns by the micro - spot on the photosensitive material 所謂激光直寫，就是利用聚焦的激光光束，由計算機控制聲光調制器的通斷以及平臺的移動，在光刻膠上進行曝光，經過顯影后得到所需要的圖形。 |
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The basic principle , theory , main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution , deep sub - micron and nanometer patterns in large field of view are deeply investigated 深入研究了無掩模激光干涉光刻技術用于高分辨、大視場、深亞微米和納米圖形生成的基本原理、理論、主要類型和實現方法。 |
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Around 1452 the first operational printing press was created , followed in 1799 by lithographic printing . now , these inventions are reflected in the world ' s first bacterial printing press 據《新科學家》雜志網站2005年5月30日消息， 1452年第一臺印刷機誕生，隨后在1799年人們發明了平版印刷技術。現在，這些舊日的發明都在世界上第一臺細菌印刷機上得到了體現。 |
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To predict lithographic results well for opc purpose , a fast , practical and efficient lithographic model , which is suitable for opc processing of complicated 1c layouts , is becoming an important research topic 因此，一種能滿足版圖opc處理軟件要求的，快速、實用而又足夠精確的光刻機光學系統模型就成為一個重要的研究課題。 |
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The main factors affecting interferometric lithographic results are deeply analyzed . the methods for improving interference pattern contrast and period stability are also studied 對影響干涉光刻結果的主要因素作了深入的分析，研究了提高干涉圖形對比度和周期穩定性的方法。 |
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A miniature , hand - held sand - blasting device used to remove unwanted images from lithographic plates . air erasers are also used to remove art without destroying the texture of the medium 中義一種小型手握的噴砂裝置，可去掉平版上不要的印紋部份而不會傷到印版。 |
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Graphic technology - process control for the manufacture of half - tone colour separations , proof and production prints - part 2 : offset lithographic processes 制圖技術.半色調分色校樣和印刷品的生產的過程控制.第2部分:膠版金屬板印刷工藝 |
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Graphic technology - process control for the manufacture of halftone colour separations , proof and production prints - part 2 : offset lithographic processes 印刷技術網目調分色片樣張和印刷成品的加工過程控制第2部分:膠印 |
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Graphic technology - colour and transparency of ink sets for four - colour - printing - sheet - fed and heat - set web offset lithographic printing 印刷技術.四色印刷用油墨調配的顏色和透明度.進紙和熱定形卷箔紙補償式平版印刷 |
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Graphic technology - process control for the production of half - tone colour separations , proof and production prints - offset lithographic processes 印刷技術.網目調分色片樣張及印刷成品的加工過程控制.膠印 |
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The lithographic and etching process for a membrane creates a mesh of metal wires with silicon dioxide filling the space between them 薄膜先以微影及蝕刻制程制作出金屬線路，線路之間則填入二氧化矽。 |
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Graphic technology - colour and transparency of ink sets for four - colour - printing - coldset offset lithographic printing 印刷技術.四色印刷油墨的色彩和透明度.冷固型油墨膠印 |