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cyclotron resonance 徊旋共振。

cyder

In this thesis , we have mainly studied the characteristics of chf3 , c6h6 and cf4 electron cyclotron resonance ( ecr ) plasma using langmuir probe and optical emission spectroscopy ( oes ) . the relative concentration of different radicals in chf3 plasma and the effect of chf3 / c6h6 ratio on bond configuration of a - c : f films were discussed . it was showed that h , f , c2 were the main radicals among radicals of h , f , c2 , ch and f2 in chf3 ecr plasma 重點研究了chf _ 3 、 cf _ 4和chf _ 3 c _ 6h _ 6放電等離子體中基團的分布;分析了不同基團的相對密度隨宏觀放電條件(微波輸入功率、放電氣壓、源氣體流量比)的變化規律;探討了等離子體中各種基團的生成途徑;在不同源氣體流量比的條件下沉積了a - c : f薄膜并通過傅立葉變化紅外吸收光譜( ftir )的測量得到了薄膜中鍵結構的信息;分析了a - c : f薄膜的沉積速率及其鍵結構與等離子體空間基團分布狀態之間的關聯。

Therefore , the diagnostics of electrical and optical characteristic of plasma form the basic respects of plasma diagnostics . the author reports in detail in the dissertation the experimental investigation on the phenomena of some common discharge systems at typical operation status such as dc glow ; rf ( radio frequency ) glow and microwave ecr ( electron cyclotron resonance ) discharge 創新之處: ( 1 )提出了雙原子分子轉動分辨發射光譜的擬合方法,并利用擬合方法進行了氮氣直流輝光放電產生的第一負帶轉動分辨光譜和磁控濺射沉積cnx膜過程中cn基團的振動帶的轉動線型擬合,獲得了相應的轉動溫度。

The fourier transform infrared ( ftir ) spectrum is an effective technology for studying the hydrogen content ( ch ) and the silicon - hydrogen bonding configuration ( si - hn ) of hudrogenated amorphous silicon ( a - si : h ) films . in the paper , ch and si - hn of a - si : h films , fabricated at different ratio of h2 / sih4 by microwave electron cyclotron resonance plasma chemical vapor ( wmecr cvd ) method , have been obtained by analyzing their ftir spectra that are treated by baseline fitting and gaussian function fitting . the effects of ratio of h2 / sih4 on ch and si - hn are studied Fourier紅外透射( ftir )譜是研究氫化非晶硅( a - si : h )薄膜中氫含量( c _ h )及硅-氫鍵合模式( si - h _ n )最有效的手段,對于微波等離子體化學氣相沉積( mwecrcvd )方法在不同h _ 2 sih _ 4稀釋比下制備出的氫化非晶硅薄膜,我們通過紅外透射光譜的基線擬合、高斯擬合分析,得出了薄膜中的氫含量,硅氫鍵合方式及其組分,并分析了這些參數隨h _ 2 sih _ 4稀釋比變化的規律。